Sputtering, sputter parameters, sputter yield advantages and applications of sputtering types of sputtering magnetron sputtering operational overview of daons precautions and safety measurements vacuum system target and substrate modules remarks contents. Sputter guns the tectra ionetch ion gun is a filamentless ion source based on a microwave plasma discharge. Plasma discharge sputter coaters have been used to create uniform thin layers of practically any target material. Clarke changed the course of history when he developed the first sputter gun that catapulted the semiconductor industry by enabling the accurate and reliable. This is a global marketplace for buyers and sellers of used, surplus or refurbished sputtering system. Organized into three parts for ease of use, this handbook introduces the fundamentals of thin films and sputtering deposition, explores the theory and practices of this field, and also covers new technology such as nanofunctional materials and mems. The verb to sputter comes from the latin word sputare meaning to to emit saliva with noise. Handbook of sputter deposition technology 2nd edition. The minimum rf or dc power ramping is 100 wattsmin. The differences between diode, magnetron, balancedunbalanced, rfdc power options, etc.
Secondary electrons are also emitted from the target surface as a result of the ion bombardment, and these electrons play an important role in maintaining the plasma. Plasma sputter coating in conventional sem sputter coating a gold goldpalladium, or platinum target is bombarded with heavy gas atoms usually argon but air is a fair substitute. Carbon graphite c sputtering targets overview our comprehensive offering of sputtering targets, evaporation sources and other deposition materials is listed by material throughout the website. The mak sputter source is available in nonuhv and uhv designs. Fine finish applications require the ultimate control, comfort and performance. For inertial confinement fusion research, a batch of several 12 mm diameter inertial fusion target shells are grown using several sputter coaters that run for 23 weeks and use 23 targets per gun. Sputter article about sputter by the free dictionary.
Sputter target erosion and its effects on long duration dc. Within the ionizatio n chamber of the gun, positive ar ions are crea ted by accelerating electrons from a hot tung sten filament into the anode. To compensate for the extremely low deposition rates, sputtering deposition requires an ultrahigh vacuum, to limit coating contamination. The development of high resolution feg sems has brought about more wide spread use of specialised techniques. Product specifications product name lithium obalt oxide li oo2 sputtering targets hemical formula lioo2 as number 12190793 qsam supplier item code dpox3st product type oxide ceramics purity range 0. It is an electronic process that deposits thin films of metals or other materials onto a variety of surfaces.
Sputtering target manufacturing supplier evaporation. During the coating processes, the sputtering target particles are ejected from a solid sputtering material due to bombardment of the target by energetic particles. The ejection of atoms or groups of atoms from the surface of the cathode of a vacuum tube as the result of heavyion impact. I am using a fresh silicon target dia 2 inch and 6mm thickness 99. The sputter gun had no trigger, but fired continuously after loading and the pulling back of its bolt, firing until it ran out of ammunition. The phi model 20045 sputter ion gun control is designed the to operate the phi model 04161 sputter ion gun. This is addressed with linear sputter source longer than the substrate is wide and then moving the substrate across the source during sputtering. The maximum rf power to any rf gun is 150 wattsduring process. The spintron 2 is a circular magnetron sputtering gun with a 2inch diameter. The use of this process to deposit a thin layer of metal on a glass, plastic, metal, or other surface in vacuum. The internal magnetic configuration utilizing a circular rareearth ndfeb permanent magnet enables excellent film uniformity and target utilization. Sputter definition of sputter by the free dictionary.
Secondary electrons are also emitted from the target surface as a result of the ion bombardment, and these electrons play an important role in. It was full of backwoods colloquialisms and it made me laugh. Rfped sputter up target pumping system cti 8 cryo pump w water cooled compressor sw 97 lid hoist one 1 plasma therm 3 kw rf generator with tuning p. But if you have any interest in understanding how the world came to be as it is, youll find this book highly rewarding. The computerized control system precisely controls turbo pump speed and gas flow and provides for scripting and recipe use in addition to manual operation.
The design and application of a sputter ion gun apparatus. This book takes a snapshot of the state of the art in various technologies relating to thin films. The halcon ml57 was a simpler derivative of the sten gun of argentine origin that was fed from a vertically inserted magazine. The ionec, a miniature ion sputtering gun, is an instrument designed for cleaning sample surfaces and depth profiling for auger electron spectroscopy. This gun generates an inert gas ion beam for sputteretching solid surfaces. Once the condition for a sustained discharge is met, the tube exhibits the characteristic glow discharge, so called because of the associated luminous glow. Below you will find budgetary pricing for sputtering targets and deposition materials per your requirements.
General data for the light machine gun and mount are as follows. Glow discharge tb sputter sputter coating technical brief 6 issue 1 3 glow discharge. Please call or email for pricing on targets, actual prices can vary due to changes of prices for precious metals. The gun was very short lived as the atf quickly reclassified it. I am completely sure that the layer is tin, but there is a chance that oxygen is also present in. It will be something that the concerned engineer will return to time after time in the course of. Sputtering targets are necessary raw materials used in physical vapor deposition thin film coating. I love this book and my 2 12 year old grandson loves this book. Hi again, as i get ready for my inspection on thursday, i have been driving it around the neighbourhood to get used to it and to see if there are any other problems. This mode is caused by the gan lattice absorption band and is observed in singlecrystallineagan at around 533 cm. Ion beam sputtering an overview sciencedirect topics. If more sputter time is needed then stop your process and keep system idle chamber under high vacuum for 1. Magnetic shielded sputter gun applicable to various targets such as metal, insulator, magnetic material, or nonmagnetic material vics film deposition chamber which installs magnetic shielded sputter gun enables you to measure the rheed patterns in the same chamber the flange mount structure enables you to attach to your current chamber. The gun produces a uniform, high density, inert gas ion beam with a beam diameter from 5 to 20mm.
Wthe mounting chamber containing the gun must be backfilled to a static pressure of 5 x 105 torr with ar gas. Perfect for all those little ones in love with vehicles. As a sputtering target manufacturer, sam supplies a wide range of materials, sizes, forms and configurations of sputtering targets for use in semiconductor, chemical vapor deposition cvd and physical vapor deposition pvd display, optical and thin film coating applications. Metal atoms ejected from the target by the ionized gas cross the plasma to deposit onto the any surface within the coating unit including the specimen.
For sales inquiries, please choose from the following email addresses, depending on your location. If you are looking to buy or sell second hand sputtering system, please visit equipmatching. An invaluable resource for industrial science and engineering newcomers to sputter deposition technology in thin film production applications, this book is rich in coverage of both historical developments and the newest experimental and technological information about ceramic thin film, a key technology for nanomaterials in highspeed information applications and largearea functional coating. Our airassisted and hvlp guns are ideal for primers, stains, varnishes or latex. Sputter deposition is a physical vapor deposition pvd method of thin film deposition by sputtering. It contains two 3 sputter guns which can operate in ar, o2 and or n2. The sputter gun, lacking a trigger, was designed to fire multiple rounds upon release of the bolt, until all ammunition was expended. He walks around quoting the catchy title sputter sputter sput. Tbsputter sputter coating technical brief 10 issue 1 6 choice of sputtering material. If you are looking for sputter targets for other brands of sputter coaters, please go to disc or foil sputter targets. The computerized control system precisely controls turbo pump speed and gas flow and provides for scripting and recipe use in addition to manual. As stated many times, metal coating is an indispensable technique for sem. In an ion beam sputtering system, ions are generated in a separate chamber, extracted into the sputtering chamber, and sputter a target in a relatively good vacuum environment sec. High vacuum magnetron sputter source 3 inch providing.
Purchase handbook of sputter deposition technology 2nd edition. It brings together in one convenient location a collection of the research results that have been gathered by many groups over the last few decades. Sputter targets for 108 and 208 series sputter coaters. Mar 29, 2016 sputter deposition is a physical vapor deposition pvd method of thin film deposition by sputtering. The lesker pvd 75 sputter system is for sputtering dielectric optical materials only. The ig2 sputter ion gun package is the perfect solution for low cost ion beam etching and sputter cleaning of specimens for surface analysis, cleaning stm tips, general vacuum science and nano technology applications. The mak sputter source has a unique feature of allowing low operational pressures 0.
Figure 2 shows the ftir spectra obtained from sad agan and sbd gan. Control is specifically designed to control the beam and focus voltages while maintaining a constant beam current from the ion gun for sputter cleaning specimens and for thin film analysis. Sep 11, 2008 the mak sputter source has a unique feature of allowing low operational pressures 0. Sputter voltage maximize sputter yield s typically 2 to 5 kv substrate bias voltage substrate is being bombarded by electrons and ions from target and plasma sputtering film while you deposit neutral atoms deposit independently put negative bias on the substrate to control this. Sputtering systems for sale new and used equipment. The base pressure of the system before gas flow is 105 mbar and the ar mass flow sccm value is set to 20. Sputter definition is to spit or squirt from the mouth with explosive sounds.
If more sputter time is needed then stop your process and keep system idle chamber under high vacuum for 1 hour, then resume process. The spintron3 is a circular magnetron sputtering gun with a 3inch diameter. Most of the electrical energy entering the plasma converts to thermal energy in the target. High vacuum magnetron sputter source 2 inch providing. Dual atcorion uhv with common loadlock system features both sputter and evaporation process chambers with 8 a320o 2 uhv sputter sources, 1 6pocket 15cc uhv linear egun, 4 resistive thermal sources, 850c rotating substrate heaters with rf bias, secondary tiltingcooled stage, rheed, computer control, loadlock cassette with insitu mask exchange for 4 diameter substrates and. Discussion in traditional hot rods started by dwleo, jun 12, 2017. While the word sputtering sounds funny to those who associate it with stammering and speech impediments, in 1970 peter j. This involves ejecting material from a target that is a source onto a substrate such as a. The sputter gun was, however, reclassified as a machine gun by the atf. Like its big brother the plasma ion source, the ionetch sputter gun works by coupling microwave energy into a coaxial waveguide and from there via evanescent wave coupling, into a plasma chamber. The aja international uhv sputtering system uses five shuttered magnetron guns containing two inch diameter targets to sputter deposit single thin films or stacked film layers on 1 4 diameter wafers, glass slides and small samples with optional substrate heating and rotation for enhanced film properties and improved film uniformity.
Graco edge ii hvlp guns provide cutting edge technology to give you the competitive edge to deliver a perfect. In motorized or mechanized units, the light machine gun is mounted on vehicular mounts of several types, but a light machine gun tripod m2 is usually carried for each gun to be used when the gun is fired from the ground. Worldwide sales territories our worldwide sales and service network is designed to guarantee quick and expert response. High quality thin films uniform and phase pure structure no contamination due to high vacuum layered structures compound thin films oxides and nitrides formation using reactive sputtering etching of substrate and target remarks. Sputtering deposition, or sputter coating, is one of the pvd technology. The simple text is engaging, with just enough repetition, and still conveys a simple story. It can accommodate a wide range of sputtering targets, metallic or insulating, magnetic or nonmagnetic. If the source of condensable material is obtained by ion beam sputtering of atoms from a target, the process is known as ion beam sputter deposition ibsd. Another common production need is depositing films on large rectangular substrates.
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